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US 6,319,746 B1Granted
Optical semiconductor device and method for fabricating the same
AssigneeNEC Corporation
InventorAtsuhiro Kawatani
Life of this patent
Estimating the term…
Abstract
Disclosed is an optical semiconductor device which has: an optical semiconductor element; and a semiconductor element region provided as a peripheral circuit for the optical semiconductor element; wherein the optical semiconductor element is mounted on a semiconductor substrate that includes the semiconductor element region.
Claims1
A method for fabricating an optical semiconductor device, comprising the steps of:
- depositing metal thin film on a silicon substrate where a semiconductor element region provided as a peripheral circuit for an optical semiconductor element is in advance formed by using a silicon semiconductor process;
- further coating said metal thin film with photoresist film;
- exposing and developing said photoresist film to expose said metal thin film at parts where to form a mark for positioning said optical semiconductor element and a V-groove for holding an optical fiber;
- removing said exposed metal thin film by etching to expose said silicon substrate;
- conducting anisotropic etching to said exposed silicon substrate to form said V-groove for holding the optical fiber;
- and
- mounting said optical semiconductor element on said silicon substrate by using said positioning mark.
4 more elements
Dependencies are inferred from the claim text.