Coating film forming method and coating apparatus
AssigneeTokyo Electron Limited
InventorHideyuki Takamori
Life of this patent
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Abstract
A spreading state of an outline of the outer periphery of a coating solution is detected by a detecting sensor, and the rotation speed or the like of a wafer as a substrate is controlled so that a spreading speed of the outline becomes not more than a predetermined speed with no danger of producing a scratchpad. Alternatively, the width in the radius direction of a scratchpad is measured, and the rotation speed or the like of the wafer is controlled so that the width in the radius direction becomes not more than a predetermined value. Thereby, occurrence of the scratchpad is prevented or the degree thereof is decreased, thereby avoiding uncoating of the coating solution on the substrate and reducing the amount of the coating solution used.
Claims12
A coating apparatus, comprising:
- means for rotating a substrate;
- means for discharging a coating solution onto a center area of the rotated substrate;
- detecting means for detecting a spreading state of an outline of an outer periphery of the coating solution, said outline formed by the coating solution when the discharged coating solution diffuses from the center area of the rotated substrate toward an outer edge of the rotated substrate;
- and
- means for controlling at least one of substrate rotation speed, discharged amount of coating solution, and coating solution discharge rate based on the detected spreading state.
A coating apparatus, comprising:
- means for rotating a substrate;
- means for discharging a coating solution onto a center area of the rotated substrate;
- detecting means for detecting a spreading state of an outline of an outer periphery of the coating solution when the discharged coating solution is diffused from the center area of the rotated substrate toward an outer edge of the rotated substrate, said outline having an outer region;
- and
- means for performing at least one of supply of a thinner onto the outer region of the outline and supply of an atmosphere including thinner onto the outer region of the outline based on the detected spreading state.
A coating apparatus, comprising:
- means for rotating a substrate at a rotation speed;
- means for discharging a coating solution onto substantially the center of the rotated substrate;
- and
- means for detecting variations in a plurality of angles formed between a plurality of protruding portions which protrude from an irregular waveform formed by breaking an outline of an outer periphery of the discharged coating solution.
Dependencies are inferred from the claim text.