Robots for microelectronic workpiece handling

A transport system for transporting a microelectronic workpiece between processing stations within a processing chamber, the transport system comprising:

• a track having a linear first guide rail and a linear second guide rail adjacent to the first guide rail and extending at least generally parallel to the first guide rail, the first and second guide rails being at approximately the same elevation;
• a first transport unit including a first support structure having a first guide member slidably carried by the first guide rail, a first elevation member projecting from the first support structure, a first arm member carried by the first elevation member, and a first end-effector carried by the first arm member, and wherein the first arm member is rotatable about a first elevation axis generally normal to the first arm member;
• and
• a second transport unit including a second support structure having a second guide member slidably carried by the second guide rail, a second elevation member carried by the second support structure, a second arm member carried by the second elevation member, and a second end-effector carried by the second arm member, wherein the second arm member is rotatable about a second elevation axis generally normal to the second arm member, wherein the first and second transport units can pass one another along the first and second rails, respectively, at approximately the same elevation, and wherein the first and second arm members are configured so that the first and second end-effectors can each access modules on both sides of the track.

A transport system for transporting a microelectronic workpiece between processing stations within a processing chamber, the transport system comprising:

• a track having a linear first guide rail and a linear second guide rail adjacent to the first guide rail and extending at least generally parallel to the first guide rail;
• a first transport unit including a first support structure having a first guide member slidably carried by the first guide rail, a first vertical member projecting from the first support structure, a first arm member carried by the first vertical member, and a first end-effector carried by the first arm member, wherein the first end-effector is positioned at a first elevation;
• and
• a second transport unit including a second support structure having a second guide member slidably carried by the second guide rail, a second vertical member carried by the second support structure, a second arm member carried by the second vertical member, and a second end-effector carried by the second arm member, wherein the first and second transport units are at approximately the same elevation, and wherein the second end-effector is at a second elevation different than the first elevation of the first end-effector such that the a first workpiece held by the first end-effector can be superimposed with a second workpiece held by the second end-effector as the first and second transport units pass one another along the track.

An apparatus for processing a microelectronic workpiece, the apparatus comprising:

• a processing chamber having a workpiece conveyor path, a first processing module on one side of the conveyor path, and a second processing module on an opposing side of the conveyor path, wherein the first processing module includes a first plurality of processing stations and the second processing module includes a second plurality of processing stations;
• an elongated track in the processing chamber, the elongated track extending along the conveyor path, and the elongated track having a first guide rail on a first side of the track facing the first processing module and a second guide rail on a second side of the track facing the second processing module, the first and second guide tracks being at least approximately at the same elevation;
• a first transport unit including a first support structure having a first guide member slidably carried by the first guide rail, a first upright member carried by the first support structure, a first arm member carried by the first upright member, and a first end effector carried by the first arm member;
• and
• a second transport unit including a second support structure having a second guide member slidably carried by the second guide rail, a second upright member carried by the second support structure, a second arm member carried by the second upright member, and a second end-effector carried by the second arm member, wherein the first and second transport units can pass each other at least at approximately the same elevation with a first workpiece carried by the first end-effector passing over a second workpiece carried by the second end-effector.