Methods of cleaning vaporization surfaces
AssigneeMicron Technology, Inc.
InventorEugene P. Marsh
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Abstract
In one aspect, the invention encompasses a method of utilizing a vaporization surface as an electrode to form a plasma within a vapor forming device. In another aspect, the invention encompasses a method of chemical vapor deposition. A vaporization surface is provided and heated. At least one material is flowed past the heated surface to vaporize the material. A deposit forms on the vaporization surface during the vaporization. The vaporization surface is then utilized as an electrode to form a plasma, and at least a portion of the deposit is removed with the plasma.
Claims8
A method of forming a vapor and cleaning a vaporization surface, comprising:
- flowing at least one liquid across a heated vaporization surface of a vapor forming device to form a vapor;
- accumulating a deposition on the heated vaporization surface as the surface is utilized for forming a vapor;
- and
- utilizing the vaporization surface as an electrode to form a plasma within the device, the plasma cleaning at least some of the deposition from the vaporization surface.
A method of forming a vapor and cleaning a vaporization surface, comprising:
- flowing at least one liquid across a heated vaporization surface of a vapor forming device to form a vapor;
- accumulating a deposition on the heated vaporization surface as the surface is utilized for forming a vapor;
- stopping the flow of all the at least one liquid;
- and
- utilizing the vaporization surface as an electrode to form a plasma within the device, the plasma cleaning at least some of the deposition from the vaporization surface.
Dependencies are inferred from the claim text.