Methods for creating wear resistant contact edges
AssigneeTessera, Inc.
InventorJoseph Fjelstad
Life of this patent
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Abstract
A method of making a contact having a wear resistant edge by forming a photoresist layer on a copper clad polyimide composite structure, patterning the photoresist layer to expose a portion of the copper; etching the copper to form a contact and/or contact tabs having etched edges, and plating a wear resistant material on the etched edges. After the photoresist layer is stripped, the top portion of the contact and/or contact tabs are etched to height that is below the height of the wear resistant edge.
Claims41
A method of making a contact having a wear resistant edge, said method comprising the steps of:
- A. providing a composite structure comprising
- a substrate;
- and
- a conductive layer;
- B. depositing a photoresist on the conductive layer to form a photoresist layer;
- C. patterning the photoresist layer to form an exposed portion of the conductive layer;
- D. forming a contact having an etched edge by etching the exposed portion of the conductive layer;
- E. plating a wear resistant material on the etched edge to form a wear resistant edge;
- F. stripping the patterned photoresist layer;
- and
- G. etching the top portion of the contact to a predetermined height which is below the height of the wear resistant edge.
A method of making a contact having a wear resistant edge, said method comprising the steps of:
- A. providing a composite structure comprising
- a substrate;
- and
- a conductive layer;
- B. depositing a photoresist on the conductive layer to form a first photoresist layer;
- C. patterning the first photoresist layer to form a hole which defines the outlines of a plurality of contact tabs and exposes a portion of the conductive layer;
- D. etching the exposed portion of the conductive layer to form the plurality of contact tabs which define an aperture in the conductive layer wherein each of the contact tabs has an etched edge;
- E. plating a wear resistant material on the etched edge of each contact tab to form wear resistant edges;
- F. stripping the first photoresist layer;
- G. depositing a photoresist on the conductive layer to form a second photoresist layer;
- H. patterning the second photoresist layer to form the outline of a contact, wherein the plurality of contact tabs are disposed within the outline of the contact;
- I. etching the conductive layer to form the contact;
- J. stripping the second photoresist layer;
- and
- K. etching the top portion of the contact to a predetermined height which is less than the height of the wear resistant edges.
A method of making a contact having a wear resistant edge, said method comprising the steps of:
- A. providing a composite structure comprising
- a substrate;
- and
- a conductive layer;
- B. depositing a photoresist on the conductive layer to form a photoresist layer;
- C. patterning the photoresist layer to form openings which define the outline of a contact and the outlines of a plurality of contact tabs disposed within the outline of each contact and which exposes a portion of the conductive layer;
- D. etching the exposed portion of the conductive layer to form a contact and a plurality of contact tabs within the contact, wherein the plurality of contact tabs an aperture in the conductive layer, and wherein each of the contact tabs has an etched edge;
- E. plating a wear resistant material on the etched edge of each contact tab to form a wear resistant edge on each contact tab;
- F. stripping the first photoresist layer;
- and
- G. etching the top portion of each contact tab to a predetermined height which is less than the height of the wear resistant edges of the contact tab.
A method of making a contact for a microelectronic component, said method comprising providing a composite structure including a substrate and at least one electrically conductive contact having an upper surface, a lower surface disposed on the substrate and an edge connecting the upper surface to the lower surface, and depositing a wear resistant material at least on said edge of said contact to form a wear resistant edge thereat.
A method of making a contact having a wear resistant edge for a microelectronic component, said method comprising providing a composite structure including a substrate and a conductive layer having an upper surface and a lower surface, said conductive layer forming a plurality of contact tabs, each of the contact tabs having a contact tab edge connecting the upper surface to the lower surface, wherein the plurality of contact tab edges define therebetween an aperture extending from the upper surface to the lower surface;
- depositing a wear resistant material on at least the edge of each contact tab to form wear resistant edges thereat;
- and forming at least one contact having at least one contact tab having a wear resistant edge disposed within an outline of the contact.
A method of making a contact having a wear resistant edge for a microelectronic component, said wear resistant edge adapted for engagement with an electrical conductive element of another microelectronic component, said method comprising providing a substrate, forming on said substrate at least one contact having an edge, and selectively depositing wear resistant material at least on said edge to form a wear resistant edge thereat.
Dependencies are inferred from the claim text.