Ester compounds, polymers, resist compositions and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakeshi Kinsho, Tsunehiro Nishi, Hideshi Kurihara, Koji Hasegawa, Takeru Watanabe, Osamu Watanabe, Mutsuo Nakashima, Takanobu Takeda, Jun Hatakeyama
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Abstract
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
Claims17
An ester compound of the following general formula (1):
- wherein
- R1 is hydrogen, methyl or CH2CO2R14;
- R2 is hydrogen, methyl or CO2R14;
- R3 is a straight, branched or cyclic alkyl group of 1 to 8 carbon atoms;
- R4, R5 and R10 to R13 each are hydrogen;
- R6 to R9 are each hydrogen or R6 and R8 or R7 and R9 form a cyclopentane ring or a bicyclo[2.2.1 ]heptane ring;
- and
- R14 is a straight, branched or cyclic alkyl of 1 to 15 carbon atoms, with the proviso that the formula also represents an enantiomer.
A polymer comprising units of an ester compound of the following general formula (1a):
- wherein
- R1 is hydrogen, methyl or CH2CO2R14;
- R2 is hydrogen, methyl or CO2R14;
- R3 is a straight, branched or cyclic alkyl group of 1 to 8 carbon atoms;
- R4, R5 and R10 to R13 each are hydrogen;
- R6 to R9 are each hydrogen or R6 and R8 or R7 and R9 form a cyclopentane ring or a bicyclo[2.2.1]heptane ring;
- and
- R14 is a straight, branched or cyclic alkyl of 1 to 15 carbon atoms,
- with the proviso that the formula also represents an enantiomer,
- said polymer having a weight average molecular weight of 1,000 to 500,000.
A method for preparing a polymer comprising effecting radical polymerization, anionic polymerization or coordination polymerization between an ester compound of formula (1) and another compound having a carbon-to-carbon double bond.
Dependencies are inferred from the claim text.