Polishing media magazine for improved polishing
OwnerTimothy J. Donohue, Roger O. Williams +5inventors
InventorsTimothy J. Donohue, Roger O. Williams, John A. Barber, Jon A. Hoshizaki, Lawrence Lee, Ching-Ling Meng, Phil R. Sommer
Life of this patent
Estimating the term…
Abstract
A polishing media magazine for improved polishing. The polishing media magazine may include a conditioning element for rapid, uniform conditioning and cleaning of the polishing media. The polishing media magazine may include polishing media having sections of raised elevation to contain the fluid and may include a polishing support platen having features adapted to urge the edges of the polishing media upwards. The polishing media may be roll fed from a supply roll across a support platen and onto a take-up roll.
Claims45
A method of conditioning a polishing media, comprising:
- (a) applying tension to the polishing media such that a tensioned web is created, said web having a width and an initial position;
- (b) indexing a portion of said tensioned web in a forward direction to pass a conditioning element at a predetermined velocity, said conditioning element spanning substantially the entire width of said tensioned web;
- and
- (c) indexing said tensioned web in a reverse direction to a final position.
A method of conditioning a polishing media, comprising:
- (a) applying tension to the polishing media such that a tensioned web is created, said web having a width and an initial position;
- (b) indexing a portion of said tensioned web in a forward direction to pass a conditioning element at a predetermined velocity, said conditioning element spanning substantially the entire width of said tensioned web;
- and
- (c) controlling the contact pressure between said tensioned web and said conditioning element by manipulating the tension applied to the web.
A method of conditioning a polishing media, comprising:
- (a) supporting said polishing media with a support platen, said polishing media having a length and a width;
- (b) forcing a conditioning element to contact said polishing media across substantially the entirety of said width;
- and
- (c) directing said conditioning element to traverse the length of said polishing media according to a predetermined path, wherein said predetermined path is a sine wave.
A method of conditioning a polishing media, comprising:
- (a) supporting said polishing media with a support platen, said polishing media having a length and a width;
- (b) forcing a conditioning element to contact said polishing media across substantially the entirety of said width;
- and
- (c) directing said conditioning element to traverse the length of said polishing media according to a predetermined path, wherein said predetermined path is a triangular wave.
A polishing media magazine for providing a conditioned polishing surface comprising, a polishing media having a width and a conditioning element extending across the full width of said polishing media, wherein at least a portion of said polishing media is tensioned, wherein said tensioned portion is positionally indexable in a first direction, such that a desired area of said tensioned portion is indexable to said conditioning element for conditioning.
A polishing media magazine for providing a conditioned polishing surface comprising:
- a polishing media having a width;
- a conditioning element extending across the full width of the polishing media, wherein at least a portion of the polishing media is tensioned;
- and
- a support platen having a generally flat upper surface, the upper surface positioned to support an area of the tensioned portion, wherein the supported area is used for polishing and the conditioning element is adapted for movement relative to the supported area movable in both a first direction and in a second direction substantially perpendicular to the first direction such that the conditioning element is capable of traversing a predetermined pattern over the supported area.
A polishing media magazine for providing a conditioned polishing surface, comprising:
- a polishing media having a width and a conditioning element extending across the full width of said polishing media, wherein at least a portion of said polishing media is tensioned;
- a support platen having a generally flat upper surface, said upper surface positioned to support an area of said tensioned portion, wherein said supported area is used for polishing, and said conditioning element is adapted for movement relative to said supported area, wherein said conditioning element is movable in both a first direction and in a second direction substantially perpendicular to said first direction such that said conditioning element is capable of traversing a predetermined pattern over said supported area;
- and
- a drive mechanism for moving said conditioning element, said drive mechanism comprising:
- (a) a first support base positioned on a first side of said process area and a second support base positioned on a second side of said process area;
- (b) a transverse support extending from said first support base to said second support base, said transverse support being selectively movable along said first direction;
- and
- (c) a conditioning element attached to a mounting structure, said mounting structure being attached to said transverse support such that said mounting structure is selectively movable along said second direction.
A polishing media magazine for providing a conditioned polishing surface, comprising:
- a polishing media having a width and a conditioning element extending across the full width of said polishing media, wherein at least a portion of said polishing media is tensioned, and wherein said conditioning element is mounted to a mounting structure, said mounting structure being adapted to self-align to a supported area when said conditioning element is forced into contact with said supported area;
- and
- a support platen having a generally flat upper surface, said upper surface positioned to support an area of said tensioned portion, wherein said supported area is used for polishing, and said conditioning element is adapted for movement relative to said supported area, wherein said conditioning element is movable in both a first direction and in a second direction substantially perpendicular to said first direction such that said conditioning element is capable of traversing a predetermined pattern over said supported area.
A polishing media magazine for providing a conditioned polishing surface, comprising:
- a polishing media having a width and a conditioning element extending across the full width of said polishing media, wherein at least a portion of said polishing media is tensioned;
- and
- a support platen having a generally flat upper surface, said upper surface positioned to support an area of said tensioned portion, wherein said supported area is used for polishing, wherein said support platen comprising a substantially planar portion and at least one raised portion adapted to direct an edge of said polishing media upwards for containing polishing fluid.
A polishing media adapted to contain polishing fluid, said polishing media comprising a substantially planar center section and two raised edge sections, wherein said polishing media is substantially impermeable to said polishing fluid and said polishing media is tensioned between a supply roll and a take-up roll.
A polishing media adapted to contain polishing fluid, said polishing media comprising a substantially planar center section and two raised edge sections, wherein said polishing media is substantially impermeable to said polishing fluid and said polishing media is a continuous belt.
A polishing platen apparatus adapted to support a polishing media, said platen comprising:
- a substantially planar portion and a raised portion adapted to direct an edge of said polishing media upwards;
- at least two raised portions arranged in an opposing relationship;
- and
- a raised element transverse to said raised portions, wherein said raised portions comprise one or more rollers.
A conditioning apparatus for conditioning a polishing media, comprising:
- a conditioning element extending across a full width of the polishing media;
- and
- a vacuum platen associated with said conditioning element, said vacuum platen positioned in proximity to the polishing media such that the polishing media is biased against said conditioning element when a vacuum is applied to said vacuum platen.
A conditioning apparatus for conditioning a polishing media, comprising:
- a conditioning element extending across a full width of the polishing media;
- and
- first and second rollers positioned relative to said conditioning element such that the polishing media is forced to contact said conditioning element, wherein said first and second rollers are independently driven with respect to the polishing media.
Dependencies are inferred from the claim text.