X-ray diffraction apparatus with an x-ray optical reference channel
AssigneeU.S. Philips Corporation
InventorWaltherus W. Van Den Hoogenhof
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AssigneeU.S. Philips Corporation
InventorWaltherus W. Van Den Hoogenhof
Estimating the term…
X-ray diffraction measurements are often carried out in a given atmosphere which may vary in respect of a variety of parameters, such as pressure, temperature, etc. Notably soft X-rays are very sensitive to atmospheric absorption. Therefore, the measured intensity is dependent not only on the material variables to be measured for the sample to be examined (10), but also on the varying absorption which thus constitutes a disturbing influencing of the X-rays in the X-ray optical path (16, 46, 50, 10, 52) from the X-ray source (7) to the detector (30). According to the invention a second X-ray optical path (54, 56, 58, 60) is established; this second path deviates from the first X-ray optical path and serves to carry out reference measurements, during or between the actual measurements, in order to determine the absorption of the atmosphere and to determine a correction factor for the X-ray intensity measured during the actual measurements.
An X-ray diffraction apparatus comprising:
Dependencies are inferred from the claim text.