Electrostatic chuck having gas cavity and method

A method of processing a substrate in a chamber, the method comprising the steps of:

• (a) placing the substrate on an electrostatic member in the chamber;
• (b) supporting the electrostatic member on a support having a coefficient of thermal expansion within about ±30% of a coefficient of thermal expansion of the electrostatic member;
• (c) providing a gas in a cavity in the support;
• and
• (d) providing an energized process gas in the chamber to process the substrate.

An electrostatic chuck for holding a substrate in a chamber, the electrostatic chuck comprising:

• (a) an electrostatic member comprising a dielectric having a surface capable of receiving the substrate, the dielectric covering an electrode that is chargeable to electrostatically hold the substrate;
• (b) a heater below the electrostatic member, the heater comprising a resistive heating element having a resistance sufficiently high to raise the temperature of the substrate by at least about 100° C.;
• and
• (c) a support below the electrostatic member, the support comprising a coefficient of thermal expansion within about ±30% of a coefficient of thermal expansion of the electrostatic member, and the support comprising a cavity that is shaped and sized to hold a gas to provide a temperature drop of at least about 100° C. between the electrostatic member and a surface of the chamber.

An electrostatic chuck for holding a substrate in a chamber, the electrostatic chuck comprising:

• (a) an electrostatic member comprising a dielectric having a surface capable of receiving the substrate, the dielectric covering an electrode that is chargeable to electrostatically hold the substrate;
• (b) a heater below the electrostatic member, the heater comprising a resistive heating element having a resistance sufficiently high to raise the temperature of the substrate by at least about 100° C.;
• and
• (c) a support below the electrostatic member, the support comprising zirconium, and the support comprising a cavity that is shaped and sized to hold a gas to provide a temperature drop of at least about 100° C. between the electrostatic member and a surface of the chamber.