Cleaning agent for a semi-conductor substrate
AssigneeWako Pure Chemical Industries, Ltd.
InventorsMasahiko Kakizawa, Ken-ichi Umekita, Ichiro Hayashida
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Abstract
This invention relates to a cleaning agent for a semi-conductor substrate, particularly, one having copper wirings on its surface, comprising a nonionic surfactant and a method for cleaning the same. The said cleaning agent and the method have made it possible to control a speed of etching on silicone oxide so as to remove impurities adsorbed on copper wirings and silicone oxide on a surface of a semi-conductor substrate having copper wirings on its surface, such as copper oxides and particles, without causing corrosion or oxidation of copper wirings nor causing roughness on the surface.
Claims9
A cleaning agent for a semi-conductor substrate, comprising a compound of the general formula [2″]
- (wherein R1 to R4 are each independently a hydrogen atom, a hydroxy group, or an alkyl having 1 to 10 carbon atoms or a haloalkyl group having 1 to 10 carbon atoms, and r, r′, s and s′ are each independently 0 or an integer and the total of r, r′, s and s′ are 1 to 20) and a quaternary ammonium compound of the general formula [5′]
- (wherein R6 to R9 are each independently a lower alkyl group having 1 to 6 carbon atoms or a hydroxy lower alkyl group having 1 to 6 carbon atoms).
Dependencies are inferred from the claim text.