Overlay matching method which eliminates alignment induced errors and optimizes lens matching

A method for creating alignment marks in overlying layers on a surface of a substrate, comprising the steps of:

• providing a reference semiconductor substrate having a surface said surface serving as a first surface;
• providing a reference stepper that is used to expose said first surface;
• providing a reference mask that contains a pattern of reference alignment marks said pattern of reference alignment marks to be created in said first surface of said reference substrate;
• depositing a first layer of photoresist over said surface of said reference substrate;
• patterning and etching said first layer of photoresist applying photolithographic procedures that use said reference mask as a photolithographic exposure mask thereby removing said layer of first photoresist from above areas in said first surface of said reference substrate where reference alignment marks have to be created;
• creating reference alignment marks in said first surface of said reference substrate;
• providing a matching stepper whereby said matching stepper is a stepper that is to be used in a semiconductor processing environment;
• depositing a second layer having a second surface over said first surface of said reference substrate whereby said second layer contains any material that is suitable to being patterned and etched;
• patterning and etching said second layer said patterning and etching to comprise exposing said second surface of said second layer using said matching stepper in combination with said reference mask thereby creating alignment marks in said second surface of said second layer;
• measuring alignment errors between said reference alignment marks in said first surface of said reference substrate and said alignment marks in said second surface of said second layer of said reference substrate thereby providing alignment error data;
• processing said alignment error data by submitting said error alignment data to modeling software whereby said modeling software provides numerical alignment correction data said numerical alignment correction data being indicative of difference in alignment between said reference stepper and said matching stepper;
• and
• apply said numerical alignment correction data to said matching stepper thereby eliminating any alignment differences that may exist between said reference stepper and said matching stepper.