US 6,309,798 B1 · Lithographical process for production of nanostructures on surfaces

Abstract

A lithographic method for the generation of nanostructures on surfaces, characterized in that either stabilized nanometer-sized transition metal clusters or colloids of metals of groups 4, 5, 6, 7, 8, 9, 10, 11 or 12 of the Periodic Table, their stabilized metal oxide or metal sulfide analogues, polynuclear metal carbonyl clusters having stoichiometrically defined compositions, or polynuclear metal clusters having stoichiometrically defined compositions or having bridges consisting of main group elements, respectively in the form of a solution, are coated on a surface as a film which is imagewise exposed with an electron beam, wherein defined structures in the nanometer range are generated on the surface after washing off the unexposed portions of the film, optionally followed by annealing.

Claims11

Dependent claims

A lithographic method for generating nanostructures on a surface, said method comprising:

a) coating said surface with a solution to form a film on said surface, said solution comprising:
i) soluble nanometer-sized tetraalkylammonium salt stabilized transition metal or bimetallic clusters or colloids of metals of groups 4-12 of the Periodic Table;
or
ii) stabilized metal oxide or metal sulfide analogs of i);
b) exposing at least one portion of said film imagewise with an electron beam;
c) washing off unexposed portions of said film, thereby leaving defined nanostructures on said surface;
and
d) optionally annealing said surface.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application

09/180,324Filed 5 Nov 1998

Priority

DE 196 18 4478 May 1996

Granted

30 Oct 2001

Term ends

Not estimatedThe source records don’t support an estimate.

Classification13 codes

G11B 5/74
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor: record carriers…
G03F 7/004
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g.…
G03F 7/0042
Photosensitive materials: with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
H10P 14/46
Of conductive or resistive materials: using a liquid

Lithographical process for production of nanostructures on surfaces

Life of this patent

Lithographical process for production of nanostructures on surfaces

Life of this patent

Abstract

Claims11