Polyimide precursor, polyimide and their use
AssigneeHitachi Chemical Company, Ltd.
InventorsHideo Hagiwara, Yasunori Kojima, Makoto Kaji, Mitsumasa Kojima, Haruhiko Kikkawa
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Abstract
A polyimide precursor having repeating units of the formula: wherein R1 is a tetravalent organic group; and R2 is a divalent diphenyl group, is excellent in image formation and particularly suitable for forming a pattern using an i-line stepper, and gives a photosensitive resin composition by imparting photosensitivity to the polyimide precursor, said photosensitive resin composition being suitable for forming surface protective films for semiconductor devices or interlaminar insulating films for multilayer wiring boards.
Claims24
A polyimide precursor (1) having repeating units represented by the formula:
- wherein R1 is a tetravalent organic group;
- and R2 is a group of the formula:
- wherein R3, R4, R5 and R6 are independently a hydrogen atom or a monovalent organic group, and at least two of R3 to R6 are independently a monovalent organic group;
- X1 and X2 are independently —COOH, —COOR13, —CONHR14 or —COO−R15+, in which —COOR13, —CONHR14 and —COO−R15+ are independently a monovalent organic group having a vinyl group, and in which R13, R14 and R15+ are independently a monovalent organic group having a vinyl group, and also (2) having repeating units of the formula (I-3) wherein R1, X1 and X2 are as defined above;
- and R2 is a group of the formula:
- wherein R9 and R10 are independently a divalent hydrocarbyl group;
- R11 and R12 are independently a monovalent hydrocarbyl group;
- and t is an integer of 1 or more.
A polyimide having repeating units of the formula:
- wherein R1 is a tetravalent organic group;
- and R2 is a group of the formula:
- wherein R3, R4, R5 and R6 are independently a hydrogen atom or a monovalent organic group, and at least two of R3 to R6 are independently a monovalent organic group, and also having repeating units of the formula (I-2) wherein R1 is as defined above;
- and R2 is a group of the formula:
- wherein R9 and R10 are independently a divalent hydrocarbyl group;
- R11 and R12 are independently a monovalent hydrocarbyl group;
- and t is an integer of 1 or more.
A photosensitive resin composition comprising
- (a) a polyimide precursor having repeating units represented by the formula:
- wherein R1 is a tetravalent organic group;
- and R2 is a group of the formula:
- wherein R3, R4, R5 and R6 are independently a hydrogen atom or a monovalent organic group, and at least two of R3 to R6 are independently a monovalent organic group;
- X1 and X2 are independently —COO−R15+, in which R15+ is a group of the formula:
- wherein R16 is an alkylene group;
- R17 and R18 are alkyl groups, and
- (b) a photoinitiator.
Dependencies are inferred from the claim text.