Organic anti-reflective coating material and its preparation
AssigneeHyundai Electronics Industries Co., Ltd.
InventorsMin-Ho Jung, Sung-Eun Hong, Ki-Ho Baik
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Abstract
Polymers are provided having the following formulas I and II: Polymers of the present invention can be used to provide an anti-reflective coating (ARC) material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain chromophore substituents which exhibit sufficient absorbance at wavelengths useful for such submicrolithography process. The ARC prevents back reflection from the surface of or lower layers in the semiconductor devices and solves the problem of the CD being altered by the diffracted and reflected light from such lower layers.
Claims44
A polymer represented by the following general formula I:
- wherein,
- R is hydrogen or a methyl group;
- R1 to R9, which are the same or different, each represents hydrogen, hydroxy, methoxycarbonyl, carboxyl, hydroxymethyl, or a substituted or unsubstituted, linear or branched C1-C5 alkyl, alkane, alkoxyalkyl or alkoxyalkane;
- w, x and y each is a mole fraction in the range from 0.01 to 0.99;
- and
- n is an integer of 1 to 4.
A polymer represented by the following general formula
- wherein,
- R is hydrogen or a methyl group;
- R1 to R9, which are the same or different, each represents hydrogen, hydroxy, methoxycarbonyl, carboxyl, hydroxymethyl, or a substituted or unsubstituted, linear or branched C1-C5 alkyl, alkane, alkoxyalkyl or alkoxyalkane;
- w, x, y and z each is a mole fraction in the range from 0.01 to 0.99;
- and
- n is an integer of 1, 3 or 4.
Dependencies are inferred from the claim text.