Method of manufacturing electron-emitting device, electron source and image-forming apparatus
AssigneeCanon Kabushiki Kaisha
InventorMitsutoshi Hasegawa
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Abstract
An electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes is manufactured. The electroconductive film is formed by applying a liquid containing the material of the film to a substrate by using an ink-jet method, then drying and heating the applied liquid. Defective conditions, if any, in the applied liquid or the precursor film formed by drying the liquid or the electroconductive film formed by heating the precursor film are detected and remedied by applying the same liquid again to the area detected for a defective condition. The detection and remedy of any defective condition may be conducted after the liquid-applying, drying or baking step.
Claims28
A method of manufacturing an electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes, characterized in that the process of forming an electroconductive film including an electron-emitting region comprises steps of applying a liquid containing precursor material of the electroconductive film to a substrate by an ink-jet method, thereafter detecting any defective area in the applied liquid, and thereafter reapplying the liquid containing the precursor material of the electroconductive film to any defective area by an ink-jet method and heat-treating the applied liquid to produce the electroconductive film,
- wherein said step of detecting any defective area in the applied liquid comprises a step of examining a precursor film of the electroconductive film formed by drying the applied liquid, and
- wherein said step of reapplying the liquid containing the precursor material is conducted after a step of applying a solvent of the precursor material to the precursor film detected to be defective in said step of examining the precursor film.
A method of manufacturing an electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes, characterized in that the process of forming an electroconductive film including an electron-emitting region comprises steps of applying a liquid containing precursor material of the electroconductive film to a substrate by an ink-jet method, thereafter detecting any defective area in the applied liquid, and thereafter reapplying the liquid containing the precursor material of the electroconductive film to any defective area by an ink-jet method and heat-treating the applied liquid to produce the electroconductive film,
- wherein said step of detecting any defective area in the applied liquid comprises a step of examining a precursor film of the electroconductive film formed by drying the applied liquid, and
- wherein said step of reapplying the liquid containing the precursor material is conducted after steps of applying a solvent of the precursor material to the precursor film detected to be defective in said step of examining the precursor film, and heating the applied solvent.
A method of manufacturing an electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes, characterized in that the process of forming an electroconductive film including an electron-emitting region comprises steps of applying a liquid containing precursor material of the electroconductive film to a substrate by an ink-jet method, thereafter detecting any defective area in the applied liquid, and thereafter reapplying the liquid containing the precursor material of the electroconductive film to any defective area by an ink-jet method and heat-treating the applied liquid to produce the electroconductive film,
- wherein said step of detecting any defective area in the applied liquid comprises a step of examining a precursor film of the electroconductive film formed by drying the applied liquid, and
- wherein said step of reapplying the liquid containing the precursor material is conducted after steps of applying a solvent of the precursor material to the precursor film detected to be defective in said step of examining the precursor film, heating the applied solvent, and thereafter exposing the applied and heated region to a reducing atmosphere.
A method of manufacturing an electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes, characterized in that the process of forming an electroconductive film including an electron-emitting region comprises steps of applying a liquid containing precursor material of the electroconductive film to a substrate by an ink-jet method, thereafter detecting any defective area in the applied liquid, and thereafter reapplying the liquid containing the precursor material of the electroconductive film to any defective area by an ink-jet method and heat-treating the applied liquid to produce the electroconductive film,
- wherein said step of detecting any defective area in the applied liquid comprises a step of examining a precursor film of the electroconductive film formed by drying the applied liquid, and
- wherein said step of reapplying the liquid containing the precursor material is conducted after steps of applying a solvent of the precursor material to the precursor film detected to be defective in said step of examining the precursor film, and sucking the solvent.
A method of manufacturing an electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes, characterized in that the process of forming an electroconductive film including an electron-emitting region comprises steps of applying a liquid containing precursor material of the electroconductive film to a substrate by an ink-jet method and thereafter detecting any defective area in the applied liquid and thereafter reapplying the liquid containing the precursor material of the electroconductive film to the defective area by an ink-jet method and heat-treating the applied liquid to produce the electroconductive film,
- wherein said step of detecting any defective area in the applied liquid comprises a step of examining the electroconductive film formed by drying and heating the applied liquid.
A method of manufacturing an electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes, characterized in that the process of forming an electroconductive film including an electron-emitting region comprises steps of applying a liquid containing precursor material of the electroconductive film to a substrate by an ink-jet method and thereafter detecting any defective area in the applied liquid and thereafter reapplying the liquid containing the precursor material of the electroconductive film to the defective area by an ink-jet method and heat-treating the applied liquid to produce the electroconductive film,
- wherein said step of detecting any defective area in the applied liquid comprises a step of examining the electroconductive film including the electron-emitting region formed in the electroconductive film formed by drying and heating the applied liquid.
Dependencies are inferred from the claim text.