Antimicrobial denture cleansing compositions
AssigneesProtech Professional Products, Inc., Denture Dynamic Inc.
InventorC. Douglas Watkins
Life of this patent
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Abstract
A denture cleansing composition includes a monoperoxysulfate compound, an effective amount a sequestering agent, such as a citrate compound, for removal of calculus and to provide a pH to the composition in solution (water) of about 3 to 5, and an effective amount of an antimicrobial agent, such as a benzoate compound, to provide antimicrobial activity to the composition to effectively kill bacteria, or other microorganisms found on the dentures. Tests conducted show that the composition is particularly effective in killing microbial strains of Streptococcus mutans, Streptococcus pyogenes, Candida albicans and Actinomyces viscosus within 20 minutes of contact.
Claims20
A denture cleansing composition comprising:
- a monopersulfate compound;
- an effective amount of a sequestering agent for calculus removal and to provide a pH of the composition in solution in the range of from about 3 to about 5;
- and
- an effective amount of an antimicrobial agent to provide antimicrobial activity to the composition to effectively kill bacteria and other microorganisms during cleansing of dentures, wherein said denture cleansing composition is devoid of perborate compounds.
A denture cleansing composition comprising:
- at least about 75 percent by weight of a monopersulfate compound;
- up to about 25 percent by weight of a sequestering agent selected from the group consisting of polyfunctional organic acids and their corresponding salts;
- and
- an effective amount of an antimicrobial agent selected from the group consisting of benzoate compounds to provide antimicrobial activity to the composition sufficient to effectively kill bacteria and other microorganisms within about one-half hour of initiation of cleansing, wherein said denture cleansing composition is devoid of perborate compounds.
Dependencies are inferred from the claim text.