Method for producing sputtering target material
AssigneeTanaka Kikinozoku Kogyo K.K.
InventorsNoriaki Hara, Somei Yarita, Ken Hagiwara, Ritsuya Matsuzaka
Life of this patent
Estimating the term…
Abstract
The invention provides a method for producing a sputtering target material including electrolyzing a molten salt mixture containing a precious metal salt and a solvent salt, to thereby deposit a precious metal or a precious metal alloy. The method enables simplification of production steps and produces high-purity target materials. In addition, the electrodeposited precious metal or precious metal alloy is heat-treated at a temperature of at least 800° C. but lower than the melting point of the precious metal, to thereby produce a target material of higher purity.
Claims11
A method for producing a sputtering target material which method comprises electrolyzing a molten salt mixture comprising a precious metal salt and a solvent salt, to thereby cause deposition of a precious metal or a precious metal alloy;
- wherein the precious metal salt is an iridium salt or a ruthenium salt.
A method for producing a sputtering target material which method comprises electrolyzing a molten salt mixture comprising a precious metal salt and a solvent salt, to thereby cause deposition of a precious metal or a precious metal alloy;
- wherein the solvent salt is a mixture of sodium chloride, potassium chloride, and cesium chloride.
A method for producing a sputtering target material which method comprises electrolyzing a molten salt mixture comprising a precious metal salt and a solvent salt, to thereby cause deposition of a precious metal or a precious metal alloy;
- wherein the precious metal or the precious metal alloy caused to be electrodeposited is subjected to a heat treatment at 800° C. or higher but lower than the melting point of the precious metal.
A method for producing a sputtering target material, wherein a precious metal or a precious metal alloy caused to be electrodeposited through a method for producing a sputtering target material which method comprises electrolyzing a molten salt mixture comprising a precious metal salt and a solvent salt, to thereby cause deposition of a precious metal or a precious metal alloy;
- is subjected to a heat treatment at 800° C. or higher but lower than the melting point of the precious metal in vacuum, to thereby remove alkali metal impurities.
Dependencies are inferred from the claim text.