Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation
AssigneeSharp Kabushiki Kaisha
InventorsMasayasu Futagawa, Kiyoshi Mito
Life of this patent
Estimating the term…
Abstract
A sputtering apparatus for forming a sputtered film on a substrate held on a substrate holder in a vacuum chamber includes a target, a deposition preventing plate provided between the target and the substrate holder, a substrate holder carrying mechanism, and a moving mechanism for moving the substrate holder carrying mechanism to change a distance between the substrate and the deposition preventing plate.
Claims14
A sputtering apparatus for forming a sputtered film on a substrate holder while carrying the substrate holder between vacuum chambers that are connected to each other via a gate valve, comprising:
- a target
- a deposition preventing plate provided between said target and said substrate holder;
- a substrate holder carrying mechanism that carries said substrate holder in a direction parallel to the surface of said substrate between the vacuum chambers;
- and
- a moving mechanism for moving said substrate holder carrying mechanism to change a distance between said substrate and said deposition preventing plate.
A sputtering apparatus for forming a sputtered film on a substrate held on a substrate holder in a vacuum chamber, comprising:
- a target;
- a deposition preventing plate provided between said target and said substrate holder;
- and
- a moving mechanism for moving said deposition preventing plate to change a distance between said substrate and said deposition preventing plate.
Dependencies are inferred from the claim text.