Methods and apparatus for processing the surface of a microelectronic workpiece

A contact assembly for providing electrical contact between a workpiece and a source of electrical power in electroplating applications, the contact assembly comprising:

• a conductive mount member having a generally annular shape with an opening sized to receive the workpiece, the mount member being the primary support structure of the contact assembly;
• a dielectric outerbody attached to the mount member, the outerbody having a barrier section projecting inwardly with respect to the mount member to an interior lip sized to engage a perimeter portion of the workpiece;
• and
• a plurality of flexing contact members electrically coupled to the mount member, the flexing contact members having a first end at least proximate to the mount member and a second end projecting inwardly from the first end to a location between the interior lip of the outerbody and the mount member, the first end of the contact members defining contact points that engage the workpiece and elastically couple the workpiece to the mount member.

A contact assembly for providing electrical contact between a workpiece and a source of electrical power in electroplating applications, the contact assembly comprising:

• a primary support structure, the primary support structure being a conductive ring having an outer annular surface, an inner annular surface, a top surface and a bottom surface, the inner annular surface being sized to allow the workpiece to pass through the primary support structure;
• an outerbody attached to the primary support structure, the outerbody having an annular barrier section projecting radially inwardly with respect to the inner annular surface of the primary support structure to an interior lip sized to engage a perimeter portion of the workpiece;
• and
• a contact system having a plurality of contact members electrically coupled to the primary support structure, the contact members having a first end at least proximate to the inner annular surface of the primary support structure and a second end defining a contact point to electrically engage the workpiece, the first ends of the contact members being generally stationary relative to the primary support structure and the second ends of the contact members projecting inwardly from the first ends to locations between the interior lip of the outerbody and the inner annular surface.

A contact assembly for providing electrical contact between a workpiece and a source of electrical power, the contact assembly comprising:

• a primary support structure having an outer wall, an inner wall, a first surface between the outer wall and the inner wall, and a second surface between the outer wall and the inner wall, wherein the inner wall defines a receiving opening larger than the microelectric workpiece;
• a barrier projecting inwardly with respect to the inner wall of the primary support structure to an interior lip configured to engage a perimeter portion of the workpiece, the interior lip of the barrier section defining a processing opening smaller than the microelectronic workpiece;
• and
• a conductive contact system attached to the primary support structure, the contact system having plurality of contact members that have a base end at least proximate to the primary support structure and a contact end projecting inwardly with respect to the inner wall to a location between the interior lip of the outerbody and the inner wall, wherein the contact members flex about the base ends toward the barrier section when the workpiece engages the contact ends and moves through the receiving opening toward the second surface of the primary support member.