Cleaning apparatus
AssigneeEbara Corporation
InventorsNaoki Matsuda, Kenya Ito, Mitsuhiko Shirakashi
Life of this patent
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Abstract
A cleaning apparatus is suitable for cleaning workpieces that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The cleaning apparatus has a holding device for holding the substrate and a cleaning unit capable of slidably contacting the surface of the substrate. The cleaning unit has a nozzle for ejecting high-pressure cleaning liquid onto the substrate, and a cleaning member surrounding the nozzle.
Claims14
A cleaning apparatus for cleaning a substrate, comprising
- a holding device for holding the substrate;
- a nozzle for ejecting high-pressure cleaning liquid onto the substrate;
- and
- a hollow member surrounding said nozzle and having a forward end projecting from a lower end of said nozzle;
- wherein said cleaning liquid has a pressure in a range of 1 to 15 Mpa.
A cleaning apparatus for cleaning a substrate, the cleaning apparatus comprising:
- a nozzle for ejecting high-pressure cleaning liquid onto the substrate;
- and
- a hollow member surrounding said nozzle, such that said hollow member and the substrate define a space for storing the cleaning liquid ejected from said nozzle, so that said high-pressure cleaning liquid ejected from said nozzle generates cavitation bubbles by passing through said cleaning liquid stored in said space.
A cleaning apparatus for cleaning a substrate, the cleaning apparatus comprising:
- a nozzle for ejecting high-pressure cleaning liquid onto the substrate;
- and
- a hollow member surrounding said nozzle;
- wherein said hollow member and the substrate define a space for storing the cleaning liquid ejected from said nozzle having a structure such that when said hollow member is positioned to clean the substrate and said high-pressure cleaning liquid is ejected from said nozzle, said high-pressure cleaning liquid becomes stored in said space and then generates cavitation bubbles by passing through said cleaning liquid stored in said space.
Dependencies are inferred from the claim text.