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US 6,307,620 B1Granted
Substrate holding apparatus, substrate transfer system, exposure apparatus, coating apparatus, method for making a device, and method for cleaning a substrate holding section
AssigneeCanon Kabushiki Kaisha
InventorsYukio Takabayashi, Shigeyuki Uzawa
Life of this patent
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Abstract
An exposure holding apparatus includes a substrate holding section for holding a substrate. The substrate holding section includes a thin film, which causes a photocatalytic reaction upon irradiation with light. This substrate holding apparatus prevents adhesion of foreign materials, which causes a decrease in yield of device production, and provides a system for rapidly removing the foreign materials.
Claims32
An exposure apparatus comprising:
- a light source for emitting a light beam to expose a substrate;
- and
- a substrate holding apparatus having a substrate holding section for holding a substrate, said substrate holding section including a thin film that causes a photocatalytic reaction upon irradiation with light,
- wherein said light source irradiates said substrate holding section with the light beam.
1 more element
A method of cleaning a substrate holding apparatus having a substrate holding section for holding a substrate, said method comprising the steps of:
- providing the substrate holder with a thin film of separated segments, which causes a photocatalytic reaction upon irradiation with light;
- moving the substrate holding section into an irradiation region of a light irradiation unit;
- and
- irradiating the substrate holding section with light from the light irradiation unit.
1 more element
Dependencies are inferred from the claim text.