US 6,307,264 B1 · Semiconductor device, active matrix substrate and process for production thereof

Abstract

A process for producing a semiconductor device comprises a step of polishing of a region of an electroconductive material serving as an electrode or a wiring line in an insulating layer formed on a semiconductor region, the region of the electroconductive material being electrically connected to the semiconductor region, wherein a region of another material is formed within the region of the electroconductive material to be polished. Also a semiconductor device having the region is provided. A process for producing an active matrix substrate comprises a step of polishing of picture element electrodes made of a metal provided on crossing portions of plural signal lines and plural scanning lines and a means for applying voltage to the picture elements, wherein a region of another material is formed within the region of the picture element electrode to be polished. An active matrix substrate has such picture element electrodes as mentioned above.

Claims20

Dependent claims

A semiconductor device comprising:

a first insulator, a metal film formed on the first insulator and a second insulator formed on the first insulator in the region of the metal film,
wherein the surface of the metal film and the surface of the second insulator substantially form the same plane and the second insulator comprises a different material from that of the first insulator, and wherein said metal film provides dishing not more than 200 Å caused by CMP polishing, the shortest distance between a wall of said metal film and said second insulator is not more than 100 μm, and said second insulator is formed as an island in said metal film.

Dependencies are inferred from the claim text.

Semiconductor device, active matrix substrate and process for production thereof

Life of this patent

Semiconductor device, active matrix substrate and process for production thereof

Life of this patent

Abstract

Claims20