Photosensitive composition and method of forming a pattern using the same

A photosensitive composition, comprising:

• an alkali-soluble polymer;
• a compound which generates an acid when exposed to chemical radiation;
• and
• an acid-decomposable compound having the structure of formula (1)
• wherein R1 and R2 are either the same or different, each of which represents at least one member selected from the group consisting of hydrogen, halogen, cyano, nitro, silyl and a monovalent organic group;
• X represents >═O or —SO2—;
• Y represents a divalent organic group;
• R1 and R2 can be bonded together, forming a ring;
• and at least one of R1 and R2 and Y has (a) a substituent which is an ester moiety, a tetrahydropyranyl ether group, an alkylcarbonate group or a silyl ether group, said substituent being decomposed by acid which is generated when said compound is exposed to chemical radiation, and said acid-decomposable compound having (b) at least one group which is converted into a —COO− or —SO3− group upon reaction with an alkaline solution after decomposition of said substituent (a).

A photosensitive composition, comprising:

• an alkali-soluble polymer;
• a compound which generates an acid when exposed to chemical radiation;
• and
• an acid-decomposable compound which has the structure of one of the following formulas (2), (3) and (4):
• formula (2):
• formula (3):
• formula (4):
• wherein R11, R,12 and R13 are either the same or different, each of which represents at least one member selected from the group consisting of hydrogen, halogen, cyano, nitro, silyl and monovalent organic group;
• X represents >═O or —SO2—;
• k is an integer ranging from 1-5, m is an integer ranging from 1-4;
• n is an integer ranging from 1-7;
• and at least one of R11, R12 and R13 is an acid decomposable substituent decomposed by acid which is generated when said compound is exposed to chemical radiation and which is an ester moiety, a tetrahydropyranyl ether group, an alkylcarbonate group or a silyl ether group;
• and said acid decomposable compound having at least one group which is converted into a —COO− or —SO3− group by reaction with an alkaline solution after decomposition of at least one of R11, R12 and R13.

A photosensitive composition comprising:

• an alkali-soluble polymer;
• a compound which generates an acid when exposed to chemical radiation;
• and
• an acid-decomposable compound having (a) at least one substituent which is an ester moiety, a tetrahydropyranyl ether group, an alkylcarbonate group, or a silyl ether group, each with at least one oxygen atom attached to the decomposable compound, which substituent is decomposed by acid which is generated when said compound is exposed to chemical radiation, and (b) at least one group which is at least one heterocyclic ring in the acid-decomposable compound and is converted into a —COO− or —SO3− group by reaction with an alkaline solution after said decomposition of said substituent (a).