Micro devices manufacturing method and apparatus therefor
AssigneeNikon Corporation
InventorsShinji Mizutani, Kazuya Ota, Masahiko Yasuda
Life of this patent
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Abstract
An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.
Claims14
A mask including:
- a plurality of first light sealed patterns arranged with a predetermined interval so as to form an alignment mark on the substrate;
- and
- a plurality of second light sealed patterns disposed between adjacent first light sealed patterns with an interval which is less than said predetermined interval.
A mask including:
- a plurality of first light transparent areas which are spaced apart from each other with a predetermined distance so as to form an alignment mark on the substrate;
- and
- a plurality of second light transparent areas, each of which is disposed between adjacent first light transparent areas with a distance of less than said predetermined distance.
An exposure apparatus comprising:
- a projection optical system which projects an image of a mark on a mask onto a substrate to form an alignment mark on said substrate;
- and
- an alignment sensor which detects said alignment mark formed on said substrate;
- wherein said alignment mark includes a plurality of first patterns having a height with a predetermined interval and a plurality of second patterns having a height with an interval of less than said predetermined interval between adjacent first patterns.
A mask comprising:
- a circuit pattern area having circuit patterns;
- and
- a mask mark formed in the predetermined positional relationship with said circuit pattern area, the mask mark including a plurality of sub-marks which are arranged one by one with predetermnined interval therebetween, said sub-marks including a plurality of patterns.
Dependencies are inferred from the claim text.