Transfer system for vacuum process equipment
AssigneeTokyo Electron Limited
InventorsJun Ozawa, Jun Hirose, Eiji Hirose, Makoto Ohara
Life of this patent
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Abstract
A transfer system 7 for carrying a wafer W into/out of a process chamber 4 is provided in a box 10 defining a load-lock chamber 3. The box 10 is divided into a first chamber 11 and a second chamber 12. A transfer arm 21 for carrying the wafer W is provided in the first chamber 11. A linearly moving system 14 for linearly moving the transfer arm 21 is provided in the second chamber 12. The internal pressure in the first chamber is set to be higher than the internal pressure in the second chamber.
Claims9
A transfer system, for use in a vacuum process equipment comprising a process chamber and a load-lock chamber, for carrying an object to be processed into/out of said process chamber, said transfer system comprising:
- a first chamber formed in said load-lock chamber;
- a second chamber formed in said load-lock chamber, said second chamber having an internal pressure which is set to be lower than an internal pressure of said first chamber;
- linearly moving transfer arm means, provided in said first chamber, for carrying said object to be processed;
- and
- a driving part, provided in said second chamber, for linearly moving said transfer arm means with respect to said process chamber.
Dependencies are inferred from the claim text.