Resin useful for resist, resist composition and pattern forming process using the same
AssigneeKabushiki Kaisha Toshiba
InventorsTakeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
Life of this patent
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Abstract
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
Claims10
A positive-working resist composition comprising a resist resin having a bridged-bond-containing aliphatic ring composed of at least two rings selected from the group consisting of 5-membered rings, 6-membered rings and 7-membered rings, and a photo acid generator, wherein at least one of the rings constituting the bridged-bond-containing aliphatic ring contained in the resin is a lactone ring.
A positive-working resist composition comprising a resist resin having a bridged-bond-containing aliphatic ring composed of at least two rings selected from the group consisting of 5-membered rings, 6-membered rings and 7-membered rings, and a photo acid generator, wherein the resist resin comprises, as a polymer unit, at least one compound selected from compounds represented by the following general formulas (III-3a), (III-3b), (III-3c) and (III-4):
- wherein R and R1 represent acryloyl or methacryloyl group.
A pattern forming process comprising the steps of:
- forming, on a substrate, a film containing a positive-working resist composition which comprises a resist resin having a bridged-bond-containing aliphatic ring composed of at least two rings selected from the group consisting of 5-membered rings, 6-membered rings and 7-membered rings, and a photo acid generator, wherein at least one of the rings constituting the bridged-bond-containing aliphatic ring contained in the resin is a lactone ring,
- subjecting the film to pattern-wise exposure, and
- developing the film exposed to light.
A resist composition comprising a resist resin having bridged-bond-containing aliphatic ring composed of at least two rings selected from the group consisting of 5-membered rings, 6-membered rings and 7-membered rings, and a photo acid generator, wherein at least one of the rings constituting the bridged-bond-containing aliphatic ring contained in the resist resin is a lactone ring.
A resist composition comprising:
- a resist resin comprising, as a polymer unit, at least one compound selected from compounds represented by the following general formulas (III-3a), (III-3b), (III-3c) and (III-4):
- wherein R and R1 represent acryloyl or methacryloyl group, and
- a photo acid generator.
Dependencies are inferred from the claim text.