Getter system for purifying the confinement volume in process chambers

A process chamber for physical vapor deposition, comprising:

• a housing;
• a substrate support disposed within said housing
• a target disposed within said housing, said target facing said substrate support,
• at least one screen disposed within said housing, said at least one screen defining a confinement volume that extends between said target and said substrate support;
• and
• a getter system disposed within said confinement volume,
• wherein the getter system comprises at least one substantially planar getter device disposed within the confinement volume such that said at least one getter device is substantially parallel to and spaced apart from the at least one screen, said at least one getter device having an inner surface facing the at least one screen and an outer surface facing the confinement volume, at least said inner surface being comprises of getter material, and said at least one getter device being spaced apart from the at least one screen such that said inner surface and the at least one screen define an inner space that is in gas flow communication with said confinement volume.