# US 6,296,985 B1 · Positive photoresist composition comprising a polysiloxane

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- Number: US 6,296,985 B1
- Document ID: US6296985B1
- Status: Granted
- Kind: B1
- Application number: 09/496,259
- Filed: 2000-02-01
- Granted: 2001-10-02
- Earliest claimed: 1999-02-01
- Assignees: Fuji Photo Film Co., Ltd.
- Inventors: Kazuyoshi Mizutani; Shoichiro Yasunami
- Web page: https://patentgrep.com/patent/US6296985B1

## CPC

- G03F 7/0757: {Macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence)}
- C08G 77/14: containing silicon bound to oxygen-containing groups
- C08G 77/26: nitrogen-containing groups
- C08K 5/00: Use of organic ingredients
- C08K 5/10: Esters; Ether-esters
- C08K 5/13: Phenols; Phenolates
- G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C08G: MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08K: Use of inorganic or non-macromolecular organic substances as compounding ingredients (paints, inks, varnishes, dyes, polishes, adhesives C09)

## Abstract

A positive photoresist composition comprising (a) an acid-decomposable polysiloxane having a structural unit represented by formula (IV): wherein Z′ is a phenyl ring substituted with an acid-decomposable group and (b) a compound which decomposes upon exposure to generate an acid.

## Claims

### Claim 1

A positive photoresist composition comprising (a) an acid-decomposable polysiloxane having a structural unit represented by formula (IV)
wherein n represents an integer of from 1 to 6; X represents a single bond or a divalent linking group;and Z′ represents a monovalent group selected from the group consisting of the groups represented by the following formula (V-1) and (V-2):
wherein R represents an acid-decomposable group; Y represents a hydrogen atom, a straight chain, branched or cyclic alkyl group, an aryl group, or an aralkyl group; 1 represents an integer of from 1 to 3; and m represents an integer of from 1 to 3, and (b) a compound which is decomposed by exposure to generate an acid.

### Claim 2 (depends on 1)

The positive photoresist composition as claimed in claim 1, which further contains (c) (c1) a phenolic compound having in the molecule a phenolic hydroxyl group at least a part of which is protected by an acid-decomposable group, or (c2) an aromatic or aliphatic carboxylic acid compound having in the molecule a carboxyl group at least a part of which is protected by an acid-decomposable group.