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US 6,296,941 B1Granted
Silicon based substrate with yttrium silicate environmental/thermal barrier layer
AssigneesGeneral Electric Company, United Technologies Corporation, Nasa
InventorsHarry Edwin Eaton, Jr., William Patrick Allen, Nathan S. Jacobson, Kang N. Lee, Elizabeth J. Opila, James L. Smialek, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
Life of this patent
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Abstract
A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a yttrium silicate.
Claims29
An article comprising:
- a substrate comprising silicon;
- and
- a yttrium containing gaseous species of Si formation inhibiting barrier layer, wherein the barrier layer inhibits the formation of gaseous species of Si when the article is exposed to a high temperature, aqueous environment.
Dependencies are inferred from the claim text.