# US 6,296,735 B1 · Plasma treatment apparatus and method for operation same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 6,296,735 B1 - Document ID: US6296735B1 - Status: Granted - Kind: B1 - Application number: 09/177,894 - Filed: 1998-10-23 - Granted: 2001-10-02 - Earliest claimed: 1993-05-03 - Assignees: Unaxis Balzers Aktiengesellschaft - Inventors: Alexander Marxer; Andreas Meyerhans; Fredy Zuend - Web page: https://patentgrep.com/patent/US6296735B1 ## CPC - C23C 16/54: Apparatus specially adapted for continuous coating - C23C 14/566: {using a load-lock chamber} - C23C 16/44: characterised by the method of coating (C23C16/04 takes precedence) - C23C 16/4401: {Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber} - H01J 37/32743: {for introducing the material into processing chamber} - H10P 72/0466: {characterised by the construction of the load-lock chamber} - H10P 72/3304: {characterised by movements or sequence of movements of transfer devices} - H10P 72/3306: {Horizontal transfer of a single workpiece} - H10P 72/3311: {Horizontal transfer of a batch of workpieces} - Y10S 414/135: Associated with semiconductor wafer handling - Y10S 414/139: including wafer charging or discharging means for vacuum chamber - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ## Abstract An apparatus for plasma treating workpieces in vacuum comprises a stack of plasma chambers (20). Handling of workpieces to and from the plasma chambers of the stack is performed in parellelism by one handling device and through lateral handling openings of the plasma chambers. The handling device is rotatable around an axis parallel to the handling openings of the plasma chambers and comprises transport means simultaneously movable radially with respect to the axis of rotation towards and from the handling openings. ## Claims ### Claim 1 Apparatus for vacuum plasma treatment, comprising at least one treatment station with at least two substrate carriers stacked one above the other and in vertical alignment, further with at least two sealably closable handling openings vertically in mutual alignment and substantially horizontally aligned with respective ones of said at least two carriers, a transport chamber communicating with said station via said handling openings and comprising a transport robot drivingly rotatable around a vertical axis in said transport chamber and comprising at least two substrate supports being vertically aligned and extending horizontally and substantially aligned with said at least two carriers respectively and being radially movable with respect to said axis. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein said treatment station comprises at least two vacuum-tight separated treatment chambers, each respectively with one of said substrate carriers and of said handling openings or comprises at least two treatment compartments within a common vacuum chamber, whereby said treatment compartments within said common vacuum chamber communicate with said vacuum chamber by open communication or via pressure stages. ### Claim 3 (depends on 2) The apparatus of claim 2, wherein said vacuum-tight treatment chambers comprise at least one pumping line each and at least one gas inlet line each or said common vacuum chamber comprises at least one pumping line and at least one gas inlet line and/or said treatment compartments in said vacuum chamber comprise at least one pumping line and/or at least one gas inlet line each. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein said treatment station comprises a number of substrate carriers which is equal or an integer multiple of the number of said supports. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein said treatment station comprises at least two two-dimensionally extended electrode arrangements, distant from and facing respectively said at least two substrate carriers. ### Claim 6 (depends on 5) The apparatus of claim 5, wherein said electrode arrangements are operationally connected to an Rf plasma discharge electric supply generator arrangement. ### Claim 7 (depends on 6) The apparatus of claim 6, wherein at least a part of said supply generator arrangement is mounted to said treatment station. ### Claim 8 (depends on 1) The apparatus of claim 1, wherein said treatment station comprises at least one gas inlet arrangement and at least one gas retrieving outlet arrangement. ### Claim 9 (depends on 1) The apparatus of claim 1, wherein said treatment station has one of the following cross-sectional shapes: Polygon, polygon with even number of sides, four-sided polygon, square. ### Claim 10 (depends on 1) The apparatus of claim 1, wherein said treatment station comprises two said substrate carriers and two said handling openings. ### Claim 11 (depends on 1) The apparatus of claim 1, wherein said robot comprises a vertical frame carrying said at least two workpiece supports, said frame being horizontally and drivingly movable from and towards said rotational axis, said at least two substrate supports extending from said frame in extracted position towards the rotational axis of said robot. ### Claim 12 (depends on 11) The apparatus of claim 11, wherein said frame is drivingly linked to a central part of said robot by means of a pair of two-lever arrangements movable in a horizontal plane, a first lever of each arrangement being drivingly pivotably linked to said central part of said robot, the second lever of each arrangement being pivotably mounted to said frame, said first and second levers of each arrangement being pivotably linked and forming an elbow-like articulation bent outwards with respect to a plane containing said rotational axis and through said frame. ### Claim 13 (depends on 1) The apparatus of claim 1, wherein said transport chamber has one of the following cross-sectional shapes: Polygon, polygon with even number of sides, four-sided polygon, square. ### Claim 14 (depends on 1) The apparatus of claim 1, further comprising a loadlock station arrangement with a number of further substrate carriers, horizontally arranged and mutually aligned vertically, the number of said further carriers being at least equal to the number of said supports. ### Claim 15 (depends on 14) The apparatus of claim 14, the number of said further carriers being equal to the number of said support multiplied by an integer. ### Claim 16 (depends on 15) The apparatus of claim 15, wherein said integer is two. ### Claim 17 (depends on 14) The apparatus of claim 14, said loadlock station arrangement comprising at least two sealably closable handling openings to said transport chamber and at least two further sealably closable handling openings to ambient, said openings to said transport chamber and said openings to ambient being respectively vertically aligned. ### Claim 18 (depends on 14) The apparatus of claim 14 said loadlock chamber arrangement comprising more than one separately operatable loadlock compartment each with at least one of said further carriers and of said handling openings and of said further handling openings. ### Claim 19 (depends on 18) The apparatus of claim 18, the number of said loadlock compartments being equal to or an integer multiple of the number of said supports. ### Claim 20 (depends on 14) The apparatus of claim 14, further comprising an ambient robot with at least one substrate carrier being horizontal. ### Claim 21 (depends on 1) The apparatus of claim 1, said supports being commonly and drivingly moveable up and down in vertical direction or being separately and drivingly movable up and down respectively in vertical direction. ### Claim 22 (depends on 1) The apparatus of claim 1, wherein said substrate is one of a flat display panel substrate, a flat active display panel substrate, a TFT display panel substrate. ### Claim 23 (depends on 22) The apparatus of claim 22, wherein said substrate is at least 30 cm×30 cm. ### Claim 24 (depends on 1) The apparatus of claim 1, said treatment station being an Rf dry etching station.