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US 6,296,711 B1Granted
Film processing system
AssigneeCVD Systems, Inc.
InventorsJames F. Loan, Jack P. Salerno
Life of this patent
Estimating the term…
Abstract
An apparatus for chemical vapor deposition includes a dispenser for dispensing a precursor to a vaporizer positioned within a vaporization chamber. A delivery conduit joins the vaporization with a process chamber. A flow meter is positioned within the delivery conduit for measuring the flow of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.
Claims18
A precursor delivery system comprising:
- a vessel defining a vaporization chamber;
- a vaporizer within the vaporization chamber, the vaporizer having a stepped sloped surface including a plurality of ridges that inhibit movement of material along the sloped surface;
- a dispenser positioned to deliver precursor onto the vaporizer;
- a heat source in thermal contact with the vaporizer for vaporizing precursor;
- and
- a vapor outlet through which vaporized precursor can exit the vaporization chamber.
3 more elements
A precursor delivery system, comprising:
- a plurality of vessels each defining a vaporization chamber;
- a vaporizer within each vaporization chamber having a stepped sloped surface including a plurality of ridges that inhibit movement of material along the sloped surface;
- a dispenser positioned to deliver precursor onto each vaporizer;
- a heat source in thermal contact with each vaporizer for vaporizing precursor;
- and
- a vapor outlet at each vaporization chamber through which vaporized precursor can exit the vaporization chamber.
3 more elements
Dependencies are inferred from the claim text.