# US 6,296,539 B1 · Method of making plasma display panel with dielectric layer suppressing reduced electrode conductivity

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- Number: US 6,296,539 B1
- Document ID: US6296539B1
- Status: Granted
- Kind: B1
- Application number: 09/490,067
- Filed: 2000-01-24
- Granted: 2001-10-02
- Earliest claimed: 1997-02-24
- Assignees: Fujitsu Limited
- Inventors: Noriyuki Awaji; Keiichi Betsui; Shinji Tadaki
- Web page: https://patentgrep.com/patent/US6296539B1

## CPC

- G06F 30/33: Design verification, e.g. functional simulation or model checking
- G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N)

## Abstract

The present invention relates to a plasma display panel comprising transparent electrodes and a dielectric layer covering said transparent electrodes on at least one substrate of a pair of substrates facing each other with a discharge space therebetween, the main constituent of the transparent electrodes is included in the dielectric layer. Further, the main constituent of the transparent electrode is indium oxide and indium oxide is included in the dielectric layer. By including the main constituent of the transparent electrodes in the dielectric layer, it is believed that the drop in conductivity caused by diffusion of the dielectric substance in the transparent electrodes during high-temperature processing is prevented.

## Claims

### Claim 1

A method of manufacturing a plasma display panel comprising a first substrate on which there are provided a plurality of transparent electrodes having indium oxide as a main constituent and a dielectric layer covering said transparent electrodes and a second substrate facing the first substrate with a discharge space therebetween, comprising:
forming a dielectric paste layer including the main constituent of the transparent electrodes and covering the transparent electrodes, on the first substrate on which the transparent electrodes are provided; and
forming a dielectric layer by firing the first substrate on which the dielectric paste layer is formed in a firing atmosphere, thus firing the dielectric paste layer.

### Claim 2 (depends on 1)

The method of manufacturing a plasma display panel according to claim 1, wherein the dielectric paste layer is formed by high temperature melting of the main constituent of the transparent electrodes and the dielectric material.

### Claim 3 (depends on 1)

The method of manufacturing a plasma display panel according to claim 1, wherein the dielectric paste layer is admixed with particles of the main constituent of the transparent electrodes.

### Claim 4

A method of manufacturing a plasma display panel comprising a first substrate on which there are provided a plurality of transparent electrodes having indium oxide as a main constituent, comprising:
forming a dielectric paste layer, including the main constituent of the transparent electrodes, on the transparent electrodes; and
firing the dielectric paste layer in a firing atmosphere, thus forming a dielectric layer covering the plurality of transparent electrodes.

### Claim 5 (depends on 4)

The method of manufacturing a plasma display panel according to claim 4, wherein the dielectric paste layer is formed by high temperature melting of the main constituent of the transparent electrodes and the dielectric material.

### Claim 6 (depends on 4)

The method of manufacturing a plasma display panel according to claim 4, wherein the dielectric paste layer is admixed with particles of the main constituent of the transparent electrodes.