Pattern forming body, pattern forming method, and their applications
AssigneeDai Nippon Printing Co., Ltd.
InventorsHironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
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Abstract
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
Claims13
A process for producing a lens having a light shielding layer, comprising:
- forming a pattern based on a difference in wettability on the surface of a transparent substrate;
- depositing a liquid containing a material for a lens on areas having specific wettability of the surface of the transparent substrate;
- curing the liquid containing the material for a lens to form a lens;
- forming a pattern, based on a difference in wettability, for a light shielding layer pattern corresponding to a lens pattern onto the transparent substrate on its backside not provided with the lens;
- depositing a liquid containing a material for the light shielding layer onto areas having specific wettability of the light shielding layer pattern in the substrate;
- and
- curing the liquid containing the material for the light shielding layer.
A lens comprising:
- a transparent substrate;
- a photocatalyst-containing layer of which the wettability is variable through photocatalytic action upon exposure to light;
- and a lens provided on the photocatalyst-containing layers in its wettability-varied areas or in its wettability-unvaried areas, wherein said photocatalyst-containing layer is provided on the backside of the transparent substrate, not provided with the lens and a light shielding layer pattern corresponding to the lens pattern is provided on the photocatalyst-containing layer in its wettability-varied areas or in its wettability-unvaried areas.
A plate for lithography characterized by comprising:
- a substrate;
- a layer provided on the substrate, the wettability of the layer being variable upon pattern-wise exposure;
- a resin layer provided on areas of which the wettability has been varied upon pattern-wise exposure;
- and areas that have been hydrophilified or lipophilified upon whole exposure.
A process for producing a plate for lithography, characterized by comprising the steps of:
- putting a layer onto a substrate, the wettability of the layer being variable through photocatalytic action upon pattern-wise exposure;
- pattern-wise exposing the layer;
- coating a resin composition to selectively form a resin layer on wettability-varied areas;
- and then conducting exposure to vary the wettability of areas not provided with the resin layer.
Dependencies are inferred from the claim text.