System and process for calibrating pyrometers in thermal processing chambers
AssigneeSteag RTP Systems, Inc.
InventorJulio L. Guardado
Life of this patent
Estimating the term…
Abstract
A method and system for calibrating radiation sensing devices, such as pyrometers, in thermal processing chambers are disclosed. The system includes a reflective device positioned opposite the radiation sensing devices and a calibrating light source which emits light energy onto the reflective device. The system is designed so that each radiation sensing device is exposed to the same intensity of light being reflected off the reflective device, which has a preset value. The radiation sensing devices are then used to measure the amount of light energy being reflected which is then compared to the preset value for making any necessary adjustments.
Claims19
A method for calibrating a temperature sensing device in a thermal processing chamber comprising the steps of:
- providing a thermal processing chamber, said thermal processing chamber containing radiation sensing devices for monitoring the temperature of a semiconductor wafer placed in said chamber, said thermal processing chamber being in communication with a plurality of light energy sources for heating semiconductor wafers contained in said chamber, said chamber further including a calibrating light source;
- placing a reflective device within said thermal processing chamber, said reflective device being positioned opposite said radiation sensing devices;
- emitting light energy from said calibrating light source onto said reflective device, said reflective device reflecting an amount of light energy having a preset value onto said radiation sensing devices;
- sensing said amount of light energy being reflected from said reflective device by said radiation sensing devices;
- and
- calibrating said radiation sensing devices based upon the amount of light energy sensed by said radiation sensing devices in relation to said preset value.
A method for calibrating temperature sensing devices in a thermal processing chamber comprising the steps of:
- providing a thermal processing chamber, said thermal processing chamber containing a plurality of pyrometers for monitoring the temperature of a semiconductor wafer placed in said chamber, said chamber further including a calibrating light source;
- placing a reflective device within said thermal processing chamber, said reflective device being positioned opposite said plurality of pyrometers;
- emitting light energy from said calibrating light source onto said reflective device, said reflective device being configured to scatter said light energy onto said pyrometers so that each of said pyrometers is exposed to substantially the same intensity of light, said intensity of light having a preset value;
- sensing said light energy being reflected from said reflective device by said plurality of pyrometers at a predetermined wavelength;
- and
- calibrating said pyrometers based upon the amount of light energy sensed by said pyrometers in relation to said preset value.
Dependencies are inferred from the claim text.