Method for fabricating a semiconductor structure having a stable crystalline interface with silicon
AssigneeMotorola, Inc.
InventorsZhiyi Yu, Jun Wang, Ravindranath Droopad, Jamal Ramdani
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Abstract
A method for fabricating a semiconductor structure comprises the steps of providing a silicon substrate (10) having a surface (12); forming on the surface of the silicon substrate an interface (14) comprising a single atomic layer of silicon, nitrogen, and a metal; and forming one or more layers of a single crystal oxide (26) on the interface. The interface comprises an atomic layer of silicon, nitrogen, and a metal in the form MSiN2, where M is a metal. In a second embodiment, the interface comprises an atomic layer of silicon, a metal, and a mixture of nitrogen and oxygen in the form MSi[N1−Ox]2, where M is a metal and X is 0≦X<1.
Claims40
A method of fabricating a semiconductor structure comprising the steps of:
- providing a silicon substrate having a surface;
- forming on the surface of the silicon substrate an interface comprising a single atomic layer of silicon, nitrogen or a mixture of nitrogen and oxygen, and a metal;
- and
- forming one or more layers of a single crystal material on the interface.
A method of fabricating a semiconductor structure comprising the steps of:
- providing a silicon substrate having a surface;
- forming one of silicon nitride, silicon oxide, or a mixture of oxide and nitride on the surface of the silicon substrate;
- providing an alkaline-earth-metal on the silicon nitride, silicon oxide, or a mixture of oxide and nitride;
- and
- heating the semiconductor structure to form an interface comprising a single atomic layer adjacent the surface of the silicon substrate.
A method of fabricating a semiconductor structure comprising the steps of:
- providing a silicon substrate having a surface;
- providing an alkaline-earth-metal on the surface of the silicon substrate;
- and
- providing silicon and nitrogen to form an interface comprising a single atomic interface with the surface of the silicon substrate.
Dependencies are inferred from the claim text.