Method and device for washing electronic parts member, or the like
AssigneesOrgano Corporation, Alps Electric Co., Ltd.
InventorsTakashi Imaoka, Yukinari Yamashita
Life of this patent
Estimating the term…
Abstract
An electronic parts members, or the like, such as the silicon wafer, etc., is washed with wash water. The wash water is prepared by dissolving a hydrogen gas or ozone gas in ultra pure water and has a negative or positive oxidation-reduction potential. This wash water has remarkably improved detergency for electronic parts. In addition, when the pH of the wash water is adjusted, the electronic parts members can be washed more effectively.
Claims26
A method for cleaning electronic parts members or the like, comprising providing high-purity water and a hydrogen gas separately, degassing the high-purity water to contain a dissolved oxygen gas of 2 ppm or less, and introducing the hydrogen gas into the degassed high-purity water to dissolve the hydrogen gas therein to provide cleaning solution having a negative oxidation-reduction potential, and washing the electronic parts members or the like with the cleaning solution.
A device for cleaning electronic parts members or the like, said device comprising a high-purity water-producing device for producing high-purity water, a hydrogen gas supplying unit for supplying a hydrogen gas, a degassing unit for degassing the high-purity water from the high-purity water-producing device to contain a dissolved oxygen gas of 2 ppm, a gas-dissolving unit for dissolving the hydrogen gas supplied from said hydrogen gas supplying unit in the produced high-purity water, a cleaning unit for cleaning said electronic parts members or the like with cleaning solution containing a hydrogen gas dissolved in high-purity water in the gas-dissolving unit and having a negative oxidation-reduction potential.
A method for cleaning electronic parts members or the like, comprising providing high-purity water and an ozone gas separately, introducing the ozone gas into the high-purity water to dissolve the ozone gas therein to produce alkaline cleaning solution having a positive oxidation-reduction potential, and cleaning the electronic parts members or the like with the alkaline cleaning solution.
A device for cleaning electronic parts members or the like, said device comprising a high-purity water-producing device for producing high-purity water, an ozone gas-supplying unit for supplying an ozone gas, a gas-dissolving unit for dissolving an ozone gas in the produced high-purity water, and a pH-adjusting unit for adjusting pH of cleaning solution which is produced by dissolving an ozone gas supplied from said ozone gas-supplying unit in the high-purity water in the gas-dissolving unit to be alkaline.
Dependencies are inferred from the claim text.