Scanning exposure method and scanning type exposure apparatus
AssigneeNikon Corporation
InventorsTadaaki Shinozaki, Masamitsu Yanagihara
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Abstract
In the scanning exposure method of the present invention, a mask and a substrate are moved in a synchronous manner, and first patterns and a second pattern are connectedly exposed on the substrate. At least a portion of the first patterns and at least a portion of the second pattern form a common pattern, and the common pattern and non-common patterns, which differ from the common pattern, are formed in mask as the first patterns and the second pattern. The first patterns and the second pattern are connected by means of the common pattern.
Claims22
A scanning exposure method in which a mask and a substrate are moved in a synchronous manner, and a first pattern and a second pattern provided on said mask are exposed onto said substrate,
- wherein said mask is smaller than said substrate, said first pattern includes a first partial pattern and a second partial pattern, said second pattern includes said second partial pattern and a third partial pattern, and
- said scanning exposure method comprising projecting said first pattern and said second pattern onto said substrate through a plurality of projection optical systems, so that said first pattern and said second pattern are joined to each other on said substrate while overlapping said second partial patterns in said first and second patterns, by moving said mask and said substrate a plurality of times in a synchronous manner.
A scanning type exposure apparatus comprising:
- a mask stage that supports a mask;
- a substrate stage that supports a substrate;
- and
- a plurality of projection optical systems that project patterns formed on said mask on said substrate;
- wherein said mask stage and said substrate stage are synchronously moved with respect to an optical path, and a first pattern and a second pattern are exposed on said substrate;
- said mask is smaller than said substrate, said first pattern includes a first partial pattern and a second partial pattern, and said second pattern includes said second partial pattern and a third partial pattern;
- said scanning type exposure apparatus further comprises a control device which controls the movement of said mask stage and said substrate stage, so that said first pattern and said second pattern are joined to each other on said substrate while overlapping said second partial patterns in said first and second patterns, by moving said mask and said substrate a plurality of times in a synchronous manner.
An exposure method in which a mask and a substrate are moved in a synchronous manner while projecting patterns formed on said mask onto said substrate by a plurality of projection optical systems, said exposure method comprising:
- a first step of exposing while synchronously moving said mask and said substrate in a predetermined direction;
- a second step of relatively shifting said substrate with respect to said plurality of projection optical systems in a direction perpendicular to said predetermined direction;
- and
- a third step of exposing a next exposure region after said second step while synchronously moving said mask and said substrate in said predetermined direction so as to join said next exposure region to a region exposed in said first step,
- wherein, in at least one of said first step and said third step, an exposure is performed while blocking at least one of said projection optical systems.
An exposure method in which a mask and a substrate are moved in a synchronous manner while projecting patterns formed on said mask onto said substrate by a plurality of projection optical systems, said exposure method comprising:
- a first step of exposing while synchronously moving said mask and said substrate in a predetermined direction;
- a second step of relatively shifting said substrate with respect to said plurality of projection optical systems in a direction perpendicular to said predetermined direction;
- and
- a third step of exposing a next exposure region after said second step while synchronously moving said mask and said substrate in said predetermined direction so as to join said next exposure region to a region exposed in said first step,
- wherein a length in said direction perpendicular to said predetermined direction of said exposure region to be exposed in said first step is different from a length of said next exposure region to be exposed in said third step.
Dependencies are inferred from the claim text.