Exposure apparatus and device manufacturing method using the exposure apparatus

An illumination apparatus comprising:

• an illumination optical system for illuminating a surface;
• a first illuminance distribution changing means for changing an illuminance distribution on the surface to be illuminated, symmetrically with respect to an optical axis;
• and
• a second illuminance distribution changing means for changing the illuminance distribution on the surface to be illuminated, asymmetrically with respect to the optical axis,
• wherein said illumination apparatus separates the illuminance distribution on the surface to be illuminated into a component symmetrical with respect to the optical axis and a component asymmetrical with respect to the optical axis, and said first and second illuminance distribution changing means independently change the respective components.

A device manufacturing method comprising the steps of:

• illuminating a reticle having a pattern with an illumination optical system;
• projecting the pattern onto a substrate using a projection optical system;
• changing, with a first illuminance distribution changing means, an illuminance distribution on a surface to be illuminated, symmetrically with respect to an optical axis;
• changing, with a second illuminance distribution changing means, the illuminance distribution on the surface to be illuminated, asymmetrically with respect to the optical axis;
• separating the illuminance distribution on the surface to be illuminated into a component symmetrical with respect to the optical axis and a component asymmetrical with respect to the optical axis;
• independently changing, with the first and second illuminance distribution changing means, the respective components;
• exposing the substrate to the pattern formed on the reticle;
• and
• developing the pattern on the exposed substrate.