Chemical vapor deposition process for fabrication of hybrid electrodes
AssigneeAdvanced Technology Materials, Inc.
InventorsJeffrey F. Roeder, Thomas H. Baum, Peter C. Van Buskirk
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Abstract
A method of fabricating an electrode structure for a ferroelectric device structure including a ferroelectric material, involving chemical vapor deposition of a hybrid electrode constituting a multilayer electrode structure or an alloyed electrode structure, using either bubbler delivery or liquid delivery chemical vapor deposition.
Claims22
A method of fabricating a hybrid electrode structure for a ferroelectric device structure including a ferroelectric material, comprising the steps of:
- vaporizing a first organometallic precursor for a first electrode metal component to form a first electrode component precursor vapor;
- vaporizing a second organometallic precursor for a second electrode metal component to form a second electrode component precursor vapor;
- and
- depositing the first electrode component precursor vapor and the second electrode component precursor vapor by liquid delivery or bubbler delivery chemical vapor deposition for formation of said hybrid electrode structure, in a deposition mode selected from the group consisting of:
- (I) simultaneous chemical vapor deposition of the first electrode metal component from the first electrode component precursor vapor and the second electrode metal component from the second electrode component precursor vapor, to yield an alloy hybrid electrode structure;
- and
- (II) sequential chemical vapor deposition of the first electrode metal component from the first electrode component precursor vapor and the second electrode metal component from the second electrode component precursor vapor, to yield a layered hybrid electrode structure including a first layer containing the first electrode metal component and a second layer containing the second electrode metal component;
- wherein at least one of the first and second electrode metal components comprises a metal selected from the group consisting of platinum, palladium, cobalt, iridium, lanthanum and rhodium.
A method of forming a hybrid electrode for a ferroelectric capacitor on a substrate, wherein the hybrid electrode includes discrete sequential layers of different metals, said method comprising bubbler delivery MOCVD or liquid delivery MOCVD of said metals from respective precursors therefor, wherein each of the respective precursors is flowed to a respective different one of multiple deposition chambers and wherein the substrate is transferred between said deposition chambers for deposition of said different metals to form said hybrid electrode.
Dependencies are inferred from the claim text.