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AssigneeSony Corporation
InventorsHideo Yamagata, Takashi Noguchi, Satoshi Hashidume
Estimating the term…
Correlation formulae having predetermined forms (i.e., straight lines representing relationships between the surface roughness of the reflectance) are determined in advance between measurement values of the ultraviolet reflectance of the surfaces of respective sample epitaxial growth layers obtained by using an ultraviolet spectrophotometer at a wavelength of 200 nm and measured values of the surface roughness of the same samples by using an atomic force microscope. The surface roughness of an ensuing measurement object is determined by measuring only its ultraviolet reflectance and substituting a resulting measurement value into the correlation formulae.
A method for evaluating surface roughness of an epitaxial growth layer formed on a substrate, comprising the steps of:
A method of measuring reflectance of an epitaxial growth layer formed on a substrate to evaluate surface roughness of the epitaxial growth layer, comprising the step of specular reflectance of the epitaxial growth layer with an ultraviolet spectrophotometer by applying ultraviolet light, the ultraviolet light having a single wavelength between 190 and 210 nm, to a surface of the epitaxial growth layer at an incident angle of about 90°.
A manufacturing method of a semiconductor device comprising the step of forming an epitaxial growth layer on a semiconductor substrate, further comprising the steps of:
Dependencies are inferred from the claim text.