Alkaline aqueous solution and method for forming pattern of photosensitive resin composition using the same

A method for forming a pattern of a photosensitive resin composition, which comprises coating, on a substrate or the like, a positive photosensitive resin composition composed of a polyamide represented by the following formula (1):

• wherein X is a tetravalent aromatic group;
• Y is a bivalent aromatic group;
• and Z is
• R1 and R2 are each a bivalent organic group, and R3 and R4 are each a monovalent organic group);
• a and b are each a mole fraction with the proviso that a+b=100 mole %, a=60.0 to 100 mole %, and b=0 to 40.0%;
• and n=2 to 500, and a diazoquinone compound, subjecting the resulting material to prebaking and then to light exposure, and dissolving and removing the exposed portions of the material with an aqueous alkaline solution containing an alkylbenzenesulfonic acid and at least one kind of compound selected from compounds of calcium, strontium and barium, to obtain a pattern, wherein the content of the alkylbenzenesulfonic acid in the total aqueous alkaline solution is 0.1 to 10% by weight, and wherein the content of the total metals of the at least one kind of compound selected from compounds of calcium, strontium and barium is 0.1 to 1 ppm relative to the total aqueous alkaline solution.