Silicon based substrate with calcium aluminosilicate/thermal barrier layer
AssigneesGeneral Electric Company, United Technologies Corporation, The United States of America as represented by the United States National Aeronautics and Space Administration
InventorsHarry Edwin Eaton, Jr., William Patrick Allen, Robert Alden Miller, Nathan S. Jacobson, James L. Smialek, Elizabeth J. Opila, Kang N. Lee, Bangalore A. Nagaraj, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
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Abstract
A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a calcium alumino silicate.
Claims20
A method for preparing an article comprising the steps of:
- providing a substrate comprising silicon;
- and
- applying a calcium containing gaseous species of Si formation inhibiting barrier layer to the substrate wherein the barrier layer inhibits the formation of gaseous species of Si when the article is exposed to a high temperature, aqueous environment.
A method according to claim 11 including the step of, after applying the barrier layer, heat treating the article.
Dependencies are inferred from the claim text.