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US 6,284,114 B1Granted
Method of fabricating a porous polymeric material by electrophoretic deposition
AssigneeRodel Holdings, Inc.
InventorsNina G. Chechik, Richard M. Levering, Jr., David B. James, Lee Melbourne Cook
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Abstract
A method is provided for the fabrication of a porous polymeric material by electrophoretic deposition. The porous polymeric material is particularly well suited as a polishing surface for the planarization of semiconductor wafers.
Claims15
A method of making a porous polishing pad material for a polishing pad, the method comprising electrophoretic deposition by immersing spaced apart electrodes in a bath, and while mixing the bath, impressing the electrodes with controlled electrical conditions, the method further comprising the steps of:
- immersing spaced apart electrodes in a bath having polymeric particles and water;
- impressing the electrodes with the controlled electrical conditions that consist of, a controlled voltage difference across the electrodes, and 4 controlled current flow through the electrodes;
- depositing the polymeric particles on one of the electrodes to form a polymeric mass while generating gaseous bubbles within the polymeric mass, which bubbles open at an exterior surface of the polymeric mass to provide a porous polishing pad material having pores therein that open at an exterior polishing surface on the polishing pad material;
- and
- varying one of the controlled electrical conditions over a time duration as a thickness of the polymeric mass increases to increase the lengths of the bubbles transverse to the thickness of the polymeric mass.
2 more elements
Dependencies are inferred from the claim text.