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US 6,284,106 B1Granted
Method of producing flat panels
AssigneeUnaxis Trading AG
InventorsWalter Haag, Pius Grunenfelder, Urs Schwendener, Markus Schlegel, Siegfried Krassnitzer
Life of this patent
Estimating the term…
Abstract
A method for producing flat panels for TFT or plasma display applications includes forming a sputter source within a sputter coating chamber, the source having at least two electrically mutually isolated stationery bar-shaped target arrangements. A controlled magnet arrangement provided under each target with a time-varying magnetron field.
Claims67
A method for producing flat panels for TFT or plasma display applications comprising:
- forming a sputter source within a sputter coating chamber by means of at least two electrically mutually isolated stationary bar-shaped target arrangements mounted one alongside the other and separated by respective slits, each of said target arrangements comprising a respective electric pad so that each of said target arrangements may be operated electrically independently from the other target arrangement;
- providing underneath of each of said target arrangements a controlled magnet arrangement generating a time varying magnetron field upon the respective target arrangement;
- and
- placing a flat panel substrate to be produced distant and parallel and adjacent to said sputter source, thereby selecting
- VQS≦3,
- wherein VQS is the ratio of sputtering surface of said source to substrate surface of said flat panel to be coated.
3 more elements
A method for producing flat panels for TFT or plasma displays, comprising:
- forming a sputter source within a sputter coating chamber by means of at least two electrically mutually isolated stationary bar-shaped target arrangements mounted one alongside the other and separated by respective slits, each of said target arrangements comprising a respective electric pad so that each of said target arrangements may be operated electrically independently from the other target arrangement;
- providing underneath each of said target arrangements an independently controllable magnet arrangement for generating a time-varying magnetron field upon the respective target arrangement;
- and
- placing a flat panel substrate to be produced into a flat panel, at a distance from and parallel to said sputter source, for controlling said independently controllable magnet arrangement so as to result in a desired sputter distribution on said flat panel substrate to produce the flat panel.
1 more element
Dependencies are inferred from the claim text.