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US 6,283,134 B1Granted
Apparatus for removing photo-resist
AssigneeUnited Microelectronics Corp.
InventorsArmy Chung, Hsi-Hsin Hong, Chi-Fa Ku
Life of this patent
Estimating the term…
Abstract
An apparatus for removing photo-resist. The apparatus comprises carriers for carrying a wafer, hot plates to remove residue solvent on the wafer, a cooling plate to decrease the wafer temperature, an reverse unit to turn over the wafer, a development unit to develop and remove photo-resist on the wafer, a top scrubbing unit to clean a top side of the wafer, and a back scrubbing unit to clean a back side of the wafer.
Claims19
An apparatus for removing photo-resist, comprising:
- a plurality of carriers, to carry a wafer;
- a plurality of hot plates, to remove residue solvent on the wafer;
- a cooling plate, to decrease the wafer temperature;
- a reverse unit, to turn over the wafer;
- a development unit having a wafer processing region, said development unit selectively developing and removing photo-resist on the wafer while the wafer is disposed in the wafer processing region;
- a top scrubbing unit, to clean a top side of the wafer;
- and
- a back scrubbing unit, to clean a back side of the wafer.
5 more elements
An apparatus for removing photo-resist, comprising:
- a plurality of carriers, to carry a wafer;
- a plurality of hot plates, to remove residue solvent on the wafer;
- a cooling plate, to decrease the wafer temperature;
- a reverse unit, to turn over the wafer;
- a development unit, to develop and remove photo-resist on the wafer, wherein the development unit comprises a wafer processing region, a first nozzle for spraying thinner on the wafer while disposed in the water processing region, a second nozzle for spraying developer on the wafer while disposed in the wafer processing region and a third nozzle for spraying a medium on the wafer while disposed in the wafer processing region;
- a top scrubbing unit, to clean a top side of the wafer;
- and
- a back scrubbing unit, to clean a back side of the wafer.
5 more elements
Dependencies are inferred from the claim text.