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US 6,283,041 B1Granted
Table support apparatus and exposure apparatus
AssigneeNikon Corporation
InventorKazuya Ono
Life of this patent
Estimating the term…
Abstract
On a sample stand having a chip levelling mechanism for amending the exposure plane of a wafer in relation to the image plane of a projection lens, a dynamic damper is provided for assigning to a holder table the appropriate rigidity in the moving direction of the holder table.
Claims25
A table support apparatus, comprising:
- a table movable in at least one optional direction, the table being subject to vibration and having a natural frequency;
- and
- a dynamic damper provided for said table, said dynamic damper being configured with physical characteristics such that a natural frequency of said dynamic damper is approximately equal to the natural frequency of said table.
An exposure apparatus, comprising:
- a table movable in at least a first direction with an object planed thereon, the table being subject to vibration and having a natural frequency;
- and
- a dynamic damper provided for said table to damp the vibration generated on said table, said dynamic damper being configured with physical characteristics such that a natural frequency of said dynamic damper is approximately equal to the natural frequency of said table.
A method of producing an exposure apparatus for exposing a pattern, comprising the steps of:
- holding an object, and providing a table movable in at least a first direction, the table being subject to vibration and having a natural frequency;
- and
- providing a dynamic damper attached to said table to damp a vibration generated on said table, and configuring said dynamic damper with physical characteristics such that a natural frequency of said dynamic damper is approximately equal to the natural frequency of said table.
An exposure apparatus, comprising:
- an exposure device having a plurality of units to expose a pattern onto an object, the units being subject to vibration and having a natural frequency;
- and
- a dynamic damper provided for at least one of said units to damp the vibration generated on said at least one of said units, said dynamic damper being configured with physical characteristics such that a natural frequency of said dynamic damper is approximately equal to the natural frequency of said at least one of said units.
An exposure apparatus that exposes a pattern onto an object, comprising:
- a table having a surface to hold said object;
- a driver connected to said table, said driver moving said table at least in a first direction perpendicular to said surface such that said table is subject to vibration, said table having a natural frequency;
- and
- a dynamic damper provided for said table to damp the vibration caused by movement of said table in the first direction.
1 more element
Dependencies are inferred from the claim text.