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US 6,281,136 B1Granted
Apparatus for etching glass substrate
AssigneeLG.Philips LCD Co., Ltd.
InventorWoong Kwon Kim
Life of this patent
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Abstract
An apparatus for etching a glass substrate includes a first bath containing an etchant, at least one porous panel having a plurality of jet holes in the first bath, the porous panel containing the etchant to jet the etchant against the glass substrate, a container storing the etchant, and a pump supplying the etchant from the container to the porous panel, the pump being connected to the container and the porous panel.
Claims9
A method for etching a glass substrate, the method comprising the steps of:
- providing a first bath including at least two porous panels having a plurality of jet holes;
- placing a glass substrate between the porous panels in the first bath;
- and
- directing a pressurized flow of etchant through the plurality of jet holes at the glass substrate.
1 more element
Dependencies are inferred from the claim text.