Multi-phase lead germanate film deposition method
AssigneeSharp Laboratories of America, Inc.
InventorsTingkai Li, Fengyan Zhang, Sheng Teng Hsu
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AssigneeSharp Laboratories of America, Inc.
InventorsTingkai Li, Fengyan Zhang, Sheng Teng Hsu
Estimating the term…
A MOCVD deposition process has been provided for the deposition of an improved PGO ferroelectric film. The inclusion of a second phase of Pb3GeO5, along with the first phase of Pb5Ge3O11, provides the film with some ferroelastic properties which direct correspond to improved ferroelectric characteristics. The inclusion of the second phase regulates to first phase crystal grain size and promotes the preferred c-axis orientation of the grains. The degree of second phase Pb3GeO5 is regulated by controlling the amount of lead in the precursor, and with additional lead added to the reactor along the oxygen used to oxidize the lead-germanium film. Critical post-deposition annealing process are also described which optimize the ferroelectric properties of the PGO film. A multi-phase PGO film and capacitor structure including multi-phase PGO film of the present invention are provided by means of the invention.
A method for forming a lead germanium oxide (PGO) film on an integrated circuit (IC) film comprising the steps of:
Dependencies are inferred from the claim text.