Photosensitive resin composition
AssigneeJsr Corporation
InventorsKatsuo Koshimura, Tsukasa Toyoshima, Takashi Nishioka, Tadaaki Tanaka
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AssigneeJsr Corporation
InventorsKatsuo Koshimura, Tsukasa Toyoshima, Takashi Nishioka, Tadaaki Tanaka
Estimating the term…
A photosensitive resin composition which comprises (1) a particulate copolymer comprising 10-99.8% by mole of the unit of (i) an aliphatic conjugated diene monomer, 0.1-30% by mole of the unit of (ii) a monomer having one polymerizable unsaturated group and an amino group, 0.1-20% by mole of the unit of (iii) a monomer having at least two polymerizable unsaturated groups and 0-40% by mole of the unit of (iv) a copolymerizable other monomer having one polymerizable unsaturated group, (2) a photopolymerizable unsaturated monomer and (3) a photopolymerization initiator typically represented by 9-fluorenone or 2-i-propylthioxanthone. A photosensitive resin composition is provided which can be developed by using water, has a low hardness and high resilience, and is excellent in balance of properties.
A photosensitive resin composition which comprises
Dependencies are inferred from the claim text.