Positive working photoresist compositions comprising a nitrogen-containing cyclic compound

Abstract

A positive working photoresist composition is provided which comprises a resin which is converted to alkali-soluble from alkali-insoluble or alkali slightly soluble by the action of an acid; an acid generator; and a nitrogen-containing cyclic compound represented by the following formula (I): wherein X represents CH2 or C(═O), two of R1, R2, R3 and R4 represent a lower alkyl and the rest two represent hydrogen; gives a good profile with a smooth pattern side even on a substrate having a high reflection; and has a wide focus margin and a good sensitivity and resolution.

Dependencies are inferred from the claim text.